清和光学（上海）有限公司Seiwa Optical （Shanghai） Co.,Ltd.

Equipment and Optical for C-MOS Power device,LED,MEMS

With 54 years of excellent experience on Optical technology, we manufacture various kinds of equipments including Double-sided Exposure System, Double-sided Pattern Inspection System,,Spin Coater& developer(Track), Multi Layer Thickness Inspection System, Nano Inprint, Photovoltaic cell Inspection System *Exposure System* Double-sided Exposure System for f300 Foup(Alignment accuracy; less than ±1µm, through put; 100 plates/H),Double-sided Exposure System for LED(through put; more than 150 plates/H),Manual Exposure System for Development, Double-sided Exposure, Film Exposure, Touch Panel Exposure(Double-Sided Pattern Alignment Inspection System).both sides alignment inspection accuracy ; less than 20nm,(CMOS, Power Device, Crystal, Ink jet, and etc)

1. 独家设计,可按照客户需求，OEM制作。

2. 从开发用Off-line设备到量产设备均可制作。

3. 掩膜板式曝光设备，有曝光模式选择功能（硬接触･软接触・非接触）　 或搭載反面对位系统，对应双面曝光。 4. 投影式曝光设备有高分辨

率（L/S=2um*)或厚膜光刻胶专用型。

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